Is a substrate miscut really required for high quality III-V/Si monolithic integration? - INSA Rennes - Institut National des Sciences Appliquées de Rennes
Communication Dans Un Congrès Année : 2021

Is a substrate miscut really required for high quality III-V/Si monolithic integration?

Simon Charbonnier
Pascal Turban
  • Fonction : Auteur
  • PersonId : 896
  • IdHAL : pturban
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hal-03402689 , version 1 (25-10-2021)

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  • HAL Id : hal-03402689 , version 1

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Charles Cornet, Simon Charbonnier, Ida Lucci, Lipin Chen, Antoine Létoublon, et al.. Is a substrate miscut really required for high quality III-V/Si monolithic integration?. 21st International Conference on Molecular Beam Epitaxy (ICMBE 2021), Sep 2021, Mexico (virtual), Mexico. ⟨hal-03402689⟩
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